Improved Double-Probe Technique for Spatially Resolved Diagnosis of Dual-Frequency Capacitive Plasmas
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Link
http://stacks.iop.org/1009-0630/15/i=6/a=05/pdf
Reference20 articles.
1. Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices
2. Dual-Frequency Superimposed RF Capacitive-Coupled Plasma Etch Process
3. Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering
4. Ion flux nonuniformities in large-area high-frequency capacitive discharges
5. Experimental study of spatial nonuniformities in 100MHz capacitively coupled plasma using optical probe
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