Development of New Positive-Tone Molecular Resists Based on Fullerene Derivatives for Extreme Ultraviolet Lithography
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
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2. Trends in photoresist materials for extreme ultraviolet lithography: A review;Materials Today;2023-07
3. Non-Destructive Characterization of Selected Types of Films and Other Layers via White Light Reflectance Spectroscopy (WLRS);Micro;2022-08-11
4. Current Status of Lithography;Laser Heat-Mode Lithography;2019
5. Positive molecular resists;Materials and Processes for Next Generation Lithography;2016
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