Theoretical Study on Chemical Gradient Generated in Chemically Amplified Resists Based on Polymer Deprotection upon Exposure to Extreme Ultraviolet Radiation-Reference-Cited by-同舟云学术

Theoretical Study on Chemical Gradient Generated in Chemically Amplified Resists Based on Polymer Deprotection upon Exposure to Extreme Ultraviolet Radiation

Published:2009-05-01 Issue: Volume:2 Page:056503
ISSN:1882-0778
Container-title:Applied Physics Express
language:en
Short-container-title:Appl. Phys. Express

Author:

Kozawa Takahiro,Tagawa Seiichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Link

http://stacks.iop.org/1882-0786/2/i=5/a=056503/pdf

Reference23 articles.

1. Recent status and future direction of EUV resist technology

2. Design of Faster High Resolution Resists: Getting More Acid Yield from EUV Photons

3. A Resist Material Study for LWR and Resolution Improvement in EUV Lithography

4. Progress in EUV Resist Development

5. Evaluation of New Molecular Resist for EUV Lithography

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1. Theoretical study of relationships among resolution, line width roughness, and sensitivity of chemically amplified extreme ultraviolet resists with photodecomposable quenchers;Japanese Journal of Applied Physics;2016-10-06

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3. Feasibility study of sub-10-nm half-pitch fabrication by chemically amplified resist processes of extreme ultraviolet lithography: I. Latent image quality predicted by probability density model;Japanese Journal of Applied Physics;2014-09-08

4. Effects of effective reaction radius for neutralization on performance of chemically amplified resists;Japanese Journal of Applied Physics;2014-05-27

5. Theoretical relationship between quencher diffusion constant and effective reaction radius for neutralization in contact hole imaging using chemically amplified extreme ultraviolet resists;Japanese Journal of Applied Physics;2014-05-08