Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer-Reference-Cited by-同舟云学术

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Electron Beam Lithography Using Highly Sensitive Negative Type of Plant-Based Resist Material Derived from Biomass on Hardmask Layer

Published:2011-10-05 Issue:10 Volume:4 Page:106502
ISSN:1882-0778
Container-title:Applied Physics Express
language:en
Short-container-title:Appl. Phys. Express

Author:

Takei Satoshi,Oshima Akihiro,Sekiguchi Atsushi,Yanamori Naomi,Kashiwakura Miki,Kozawa Takahiro,Tagawa Seiichi

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Link

http://stacks.iop.org/1882-0786/4/i=10/a=106502/pdf

Reference11 articles.

1. Effect of selective nanopatterns on the performance of a pentacene-based thin-film transistor

2. Novel CD-SEM magnification calibration reference of sub-50-nm pitch multi-layer grating with positional identification mark

3. Possibility of Forming 18-nm-Pitch Ultrahigh Density Fine Dot Arrays for 2 Tbit/in.2Patterned Media Using 30-keV Electron Beam Lithography

4. Difference of Spur Distribution in Chemically Amplified Resists upon Exposure to Electron Beam and Extreme Ultraviolet Radiation

5. Development of plant-based resist materials in electron beam lithography

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A sustainable biomass-based electret for face mask and non-volatile transistor memory;Organic Electronics;2024-01

2. Chitosan as a water-based photoresist for DUV lithography;Advances in Patterning Materials and Processes XL;2023-05-01

3. A Biomass-Based Electret Filter with Persistent Electrostatic Charges for Eco-Friendly and Greener Face Mask Material;2023

4. Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography;ACS Applied Polymer Materials;2022-05-20

5. Thermal nanoimprint lithography of sodium hyaluronate solutions with gas permeable inorganic hybrid mold for cosmetic and pharmaceutical applications;Applied Physics Express;2022-03-21

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