Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography-Reference-Cited by-同舟云学术

Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography

Published:2022-05-20 Issue:6 Volume:4 Page:4508-4519
ISSN:2637-6105
Container-title:ACS Applied Polymer Materials
language:en
Short-container-title:ACS Appl. Polym. Mater.

Author:

Sysova Olha¹²,Durin Paule³⁴,Gablin Corinne⁴,Léonard Didier⁴^ORCID,Téolis Alexandre⁵,Trombotto Stéphane⁵,Delair Thierry⁵,Berling Dominique¹²,Servin Isabelle⁶,Tiron Raluca⁶,Bazin Arnaud⁶,Leclercq Jean-Louis³,Chevolot Yann³,Soppera Olivier¹²^ORCID

Affiliation:

1. Université de Haute-Alsace, CNRS, IS2M UMR 7361, Mulhouse F-68100, France

2. Université de Strasbourg, Strasbourg Cedex F-67081, France

3. Univ Lyon, CNRS, INSA Lyon, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, Ecully Cedex 69134, France

4. Univ Lyon, CNRS, Université Claude Bernard Lyon 1, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, Villeurbanne F-69100, France

5. Univ Lyon, CNRS, UMR 5223, Ingénierie des Matériaux Polymères, Université Claude Bernard Lyon 1, INSA Lyon, Université Jean Monnet, Villeurbanne Cédex F-69622, France

6. Univ. Grenoble Alpes, CEA, LETI, Grenoble F-38000, France

Funder

Agence Nationale de la Recherche

Publisher

American Chemical Society (ACS)

Subject

Organic Chemistry,Polymers and Plastics,Process Chemistry and Technology

Link

https://pubs.acs.org/doi/pdf/10.1021/acsapm.2c00475

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1. Pilot study of specific microbe immobilization cells (SMICs) technology in removing tetramethyl ammonium hydroxide for reuse of low-strength electronics wastewater

2. Biological treatment of TMAH (tetra-methyl ammonium hydroxide) in a full-scale TFT-LCD wastewater treatment plant