High Resolution Positive-Working Molecular Resist Derived from Truxene-Reference-Cited by-同舟云学术

High Resolution Positive-Working Molecular Resist Derived from Truxene

Published:2009 Issue:5 Volume:22 Page:609-614
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Hattori Shigeki,Yamada Arisa,Saito Satoshi,Asakawa Koji,Koshiba Takeshi,Nakasugi Tetsuro

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/22/5/22_5_609/_pdf

Reference24 articles.

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2. 2. H. B. Cao, W. Yeuh, B. J. Rice, J. Roberts, T. Bacuita, M. Chandhok, Proc. SPIE, 5376, 757 (2004).

3. Current Status of EUV Photoresists

4. 4. H. B. Cao, J. M. Roberts, J. Dalin, M. Chandhok, R. P. Meagley, E. M. Panning, M. K. Shell, B. J. Rice, "Intel's EUV resist development" Proc. SPIE-The International Society for Optical Engineering, 5039, (Pt. 1, Advances in Resist Technology and Processing XX), 484 (2003).

5. 5. K. Okumura, Proc. the Workshop on Semiconductor Technology for 21st Century, Tokyo, Japan, 6-7 June, 3 (2000).

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