Materials Development to Extend ArF Lithography Toward Sub-20nm Patterning
Author:
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/25/1/25_115/_pdf
Reference5 articles.
1. Chemical Amplification Resists: Laboratory Curiosity to Paradigm
2. Density Multiplication by Directed Self-assembly of Block Copolymer Binary Blends
3. Directed Self-assembly on Sparse Chemical Patterns for Lithographic Applications
4. 20nm Pitch Directed Block Copolymer Assembly Using Solvent Annealing for Bit Patterned Media
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