Chemical Amplification Resists: Laboratory Curiosity to Paradigm-Reference-Cited by-同舟云学术

Chemical Amplification Resists: Laboratory Curiosity to Paradigm

Published:2007 Issue:3 Volume:20 Page:319-332
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Ito Hiroshi

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/20/3/20_3_319/_pdf

Reference60 articles.

1. 1. a) H. Ito, C. G. Willson and J. M. J. Frechet, 1982 Symposium on VLSI Technology, Oiso, Japan, 1982.

2. b) H. Ito, C. G. Willson, Polym. Eng. Sci., 23 (1983) 1012; c) H. Ito, C. G. Willson, Polymers in Electronics, Davidson, T., ed., American Chemical Society, Washington, D. C., 1984, p11.

3. Chemical Amplification Resists for Microlithography

4. 3. C. G. Willson, R. Miller, D. McKean, N. Clecak, T. Thompkins, D. Hofer, J. Michl, and J. Downing, Polym. Eng. Sci., 23 (1983) 1004.

5. 4. C. Aso, S. Tagami, T. Kunitake, J. Polym. Sci., Part A-17 (1969) 497.

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