1. Under layer designs to enhance the performances of EUV resists,;Cui,2009
2. Development of resist material and process for hp-2X-nm devices using EUV lithography,;Matsnaga,2010
3. Patten transfer process development for EUVL,;Kawamura,2009
4. The novel spin-on hard mask and ultra thin UL material for EUVL,;Sakamoto,2012
5. EUV lithography & etching performance enhancement by EUV sensitive Si hard mask (EUV SI-HM) for 1X nm hp generation,;Shibayama,2014