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Directed Self-assembly on Sparse Chemical Patterns for Lithographic Applications

  • Published:2009 Issue:2 Volume:22 Page:219-222
  • ISSN:0914-9244
  • Container-title:Journal of Photopolymer Science and Technology
  • language:en
  • Short-container-title:J. Photopol. Sci. Technol.

Author:

Cheng Joy Y.,Nelson Alshaki,Rettner Charles T.,Sanders Daniel P.,Sutherland Alexander,Pitera Jed W.,Na Young-Hye,Kim Ho-Cheol,Hinsberg William

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of wall potential on morphology of symmetric diblock copolymers in nanotrench;Japanese Journal of Applied Physics;2016-04-13

2. Nanomanufacturing: A Perspective;ACS Nano;2016-02-22

3. Polymer blends for directed self-assembly;Alternative Lithographic Technologies V;2013-03-26

4. Directed Self Assembly Materials for Semiconductor Lithography;Journal of Photopolymer Science and Technology;2013

5. Materials Development to Extend ArF Lithography Toward Sub-20nm Patterning;Journal of Photopolymer Science and Technology;2012
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