Studying Resist Stochastics with the Multivariate Poisson Propagation Model
Author:
Affiliation:
1. Center for X-ray Optics, Lawrence Berkeley National Laboratory
2. EECS, University of California
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/27/6/27_747/_pdf
Reference10 articles.
1. 1. P. Naulleau, K. Goldberg, E. Anderson, K. Bradley, R. Delano, P. Denham, B. Gunion, B. Harteneck, B. Hoef, H. Huang, K. Jackson, G. Jones, D. Kemp, A. Liddle, R. Oort, A. Rawlins, S. Rekawa, F. Salmassi, R. Tackaberry, C. Chung, L. Hale, D. Phillion, G. Sommargren, J. Taylor, “Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optic,” Proc. SPIE., 5374 (2004) 881-891.
2. 2. P. Naulleau, K. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa,“Fourier-synthesis custom-coherence illuminator for EUV microfield lithography,” Appl. Opt., 42, (2003) 820-826.
3. 3. C. Anderson, D. Ashworth, L. Baclea-An, S. Bhattari, R. Chao, R. Claus, P. Denham, K. Goldberg, A. Grenville, G. Jones, R. Miyakawa, K. Murayama, H. Nakagawa, S. Rekawa, J. Stowers, P. Naulleau, “The SEMATECH Berkeley MET: Demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm,” Proc. SPIE., 8322, (2012) 832212.
4. 4. http://www.itrs.net/Links/2013ITRS/Summary 2013.htm
5. 5. G. Gallatin, “Resist blur and line edge roughness,” Proc. SPIE., 5754, (2005)38-52.
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Modeling of novel resist technologies;Advances in Patterning Materials and Processes XXXVI;2019-03-25
2. Relative importance of various stochastic terms and EUV patterning;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-10-04
3. Photo-induced Fragmentation of a Tin-oxo Cage Compound;Journal of Photopolymer Science and Technology;2018-06-25
4. Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2017-11
5. Extreme ultraviolet patterning of tin-oxo cages;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-09-15
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3