Modeling of novel resist technologies
Author:
Publisher
SPIE
Reference13 articles.
1. Resist blur and line edge roughness;Gallatin,2005
2. Studying Resist Stochastics with the Multivariate Poisson Propagation Model
3. Relative importance of various stochastic terms and EUV patterning
4. Photoresist and stochastic modeling
5. Simulation analysis of LER and dose tradeoffs for EUV resists with photo-decomposable quenchers;Bhattarai,2013
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1. Three-dimensional modeling of EUV photoresist using the multivariate Poisson propagation model;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-07-02
2. Multiscale simulation of extreme ultraviolet nanolithography: impact of acid–base reaction on pattern roughness;Journal of Materials Chemistry C;2021
3. Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations;Journal of Micro/Nanolithography, MEMS, and MOEMS;2020-08-27
4. Investigating EUV radiation chemistry with first principle quantum chemistry calculations;International Conference on Extreme Ultraviolet Lithography 2019;2019-11-20
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