Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography

Published:2017-11 Issue:6 Volume:35 Page:061602
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Bhattarai Suchit¹,Neureuther Andrew R.¹,Naulleau Patrick P.²

Affiliation:

1. Department of Electrical Engineering and Computer Sciences, UC Berkeley, Berkeley, California 94720

2. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720

Funder

Integrated Modeling Process and Computation for Technology (IMPACT+)

U.S. Department of Energy

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/am-pdf/10.1116/1.4991054

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