Trilayer Development for 193nm Immersion Lithography-Reference-Cited by-同舟云学术

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Trilayer Development for 193nm Immersion Lithography

Published:2007 Issue:5 Volume:20 Page:679-686
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Burns Sean,Burkhardt Martin,Goldfarb Dario,Lustig Naftali,Pfeiffer Dirk,Brodsky Mary Jane,Clancy Alexandra,Medeiros David

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/20/5/20_5_679/_pdf

Reference13 articles.

1. 1. S. Burns et al. Proc. SPIE., 6153, (2006)

2. 2. N.N. Matsuzawa et al. Proc. SPIE, 6153 (2006)

3. 3. D. Abdallah et al. Proc SPIE, Adv. Res. Tech. (2007)

4. 4. H. Zhuang et al. , Proc. SPIE, 6153, (2006)

5. 5. K. Nakayama et al., Proc. SPIE, 5039 (2003), 920

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