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Condensation Behavior of Nanoscale Bubbles on ArF Excimer Resist Surface Analyzed by Atomic Force Microscope

  • Published:2005 Issue:3 Volume:18 Page:349-354
  • ISSN:0914-9244
  • Container-title:Journal of Photopolymer Science and Technology
  • language:en
  • Short-container-title:J. Photopol. Sci. Technol.

Author:

Kawai Akira

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Reference8 articles.

1. 1. A. Kawai, Ext. Abstr. 51st Spring Meet. Japan Society of Applied Physics and Related Societies (2004) 29a-G-9 p777.

2. 2. A. Kawai, A. Ishikawa. Ext. Abstr. 52nd Spring Meet. Japan Society of Applied Physics and Related Societies (2005) 31p-YW-16 p840.

3. Micro Bubbles Captured at Micro Defect on Resist Film

4. 4. A. Kawai, M. Hirano, T. Niiyama, J.PhotopolymerSci. Technol., 17 (2004) 461.

5. Atomic Force Microscope

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5. Micro Bubbles formed on ArF Excimer Resist Surface detected by Tip Scanning Method;Journal of Photopolymer Science and Technology;2007
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