Analysis for Drying Behavior of Rinse Water Depended on Resist Pattern Arrangement-Reference-Cited by-同舟云学术

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Analysis for Drying Behavior of Rinse Water Depended on Resist Pattern Arrangement

Published:2004 Issue:3 Volume:17 Page:461-464
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kawai Akira,Hirano Masahito,Niiyama Takayoshi

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/17/3/17_3_461/_pdf

Reference7 articles.

1. Mechanism of Resist Pattern Collapse during Development Process

2. 2. J. Drelich, J. S. Laskowski and K. L. Mittal, "Apparent and Microscopic Contact Angles", VSP, VB (2002).

3. 3. A. W. Adamson, "Physical Chemistry of Surface", 4th ed. John Wiley & Sons. Inc. (1990).

4. The effect of drop size on contact angle

5. The Effect of Drop (Bubble) Size on Advancing and Receding Contact Angles for Heterogeneous and Rough Solid Surfaces as Observed with Sessile-Drop and Captive-Bubble Techniques

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Bubbles Condensed at Water/resist Interface analyzed by AFM;Journal of Photopolymer Science and Technology;2007

2. Condensation Behavior of Nanoscale Bubbles on ArF Excimer Resist Surface Analyzed by Atomic Force Microscope;Journal of Photopolymer Science and Technology;2005

3. The Photopolymer Science and Technology Award;Journal of Photopolymer Science and Technology;2005

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