Micro Bubbles Captured at Micro Defect on Resist Film
Author:
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
http://www.jstage.jst.go.jp/article/photopolymer/17/1/17_1_105/_pdf
Reference3 articles.
1. 1. A. Kawai and H. Endo, Ext. Abstr. 51th Spring Meet. Japan Society of Applied Physics and Related Societies, Tokyo, March, (2004) 777, No.29a-G-9.
2. ATTRACTIVE FORCES AT INTERFACES
3. 3. D. H. Kaelble, J. Appl. Polym. Sci., 18 (1974) 1869.
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5. Removal mechanism of nano-bubble with AFM for immersion lithography;Microelectronic Engineering;2006-04
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