Author:
Kushida Yuki,Makita Yutaka,Kawakami Takanori,Hoshiko Kenji,Nakagawa Hiroki,Nishimura Yukio,Yamaguchi Yoshikazu
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference9 articles.
1. Improvement of Defect Issues for Advanced 193nm Resist
2. Micro Bubbles Captured at Micro Defect on Resist Film
3. Adhesion Mechanism of Micro Bubbles on ArF and F2 Excimer Resists
4. Materials and Process Parameters on ArF Immersion Defectivity Study
5. 5. S. Skordas, R. L. Burns, D. L. Goldfarb, S. D. Burns, M. Angelopoulos, C. J. Brodsky, M. C. Lawson, C. J. Pillette, J. J. Bright, R. L. Isaacson, M. E. Lagus, V. Vishnu, Proc. SPIE, 5376 (2004), 471
Cited by
12 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献