Micro Channel Device composed by Dry Film Resist
Author:
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
http://www.jstage.jst.go.jp/article/photopolymer/21/1/21_1_43/_pdf
Reference6 articles.
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2. 2. Fan Y, Lafferty N, Bourov A, Zavyalova L, Smith BW., Proc. SPIE 5377, (2004) 487.
3. Condensation Behavior of Nanoscale Bubbles on ArF Excimer Resist Surface Analyzed by Atomic Force Microscope
4. Adhesion Mechanism of Micro Bubbles on ArF and F2 Excimer Resists
5. 5. F. M. Fowkes, Ind. Eng. Chem. 56 (1964) 40.
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