Removal of Positive-tone Diazonaphthoquinone/Novolak Resist Using UV Laser Irradiation-Reference-Cited by-同舟云学术

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Removal of Positive-tone Diazonaphthoquinone/Novolak Resist Using UV Laser Irradiation

Published:2005 Issue:2 Volume:18 Page:181-185
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Horibe Hideo,Kamiura Tomosumi,Yoshida Kunio

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/18/2/18_2_181/_pdf

Reference8 articles.

1. 1. S. Saito and M. Minato, "Ashing equipment," Semiconductor World (Monthly) 64(1993) [in Japanese].

2. 2. A. Takanashi, Semicon News, 47(1988) [in Japanese].

3. Reproductive Rights are Human Rights

4. 4. S. Noda, H. Horibe, M. Kuzumoto and T. Kataoka, J. Adv. Oxidation Tech., 6(2) 132(2003).

5. Development of a Photoresist Removal Method Using Ozone Gas with Water Vapor for LCD Manufacturing

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4. Oxygen additive amount dependence of rate of photoresist removal by H radicals generated on a tungsten hot-wire catalyst;Japanese Journal of Applied Physics;2016-06-14

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