Author:
Noda Seiji,Miyamoto Makoto,Horibe Hideo,Oya Izumi,Kuzumoto Masaki,Kataoka Tatsuo
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference14 articles.
1. Lateral Diffusion of Na+ Ions from the Gate Edge into the Oxide for P+ and N+ Polycrystalline Silicon Gates
2. H. Kikuchi,Monthly FPD Intelligence, Chap. 4, pp. 169-172, Press Journal, Japan (1999), in Japanese.
3. Effect of Gas Addition on Ozone Ashing
4. Temperature and concentration effects on ozone ashing of photoresist
5. Natraj Narayanswami and Steve Nelson, inProceedings of the 3rd International Symposium on Ultra Clean Processing of Silicon Surfaces, pp. 66-67, Oostende, Belgium (1998).
Cited by
41 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献