Author:
Noda Seiji,Horibe Hideo,Kawase Kazumasa,Miyamoto Makoto,Kuzumoto Masaki,Kataoka Tatsuo
Abstract
AbstractA photo-resist removal process, using highly-concentrated ozone gas and water vapor, has been investigated in the presence of ammonia. Test substrates (size 520 mm × 410 mm) coated with I-line resist and with pretreatment (140°C baking in 3000 sec and SF
Publisher
Sycamore Global Publications
Subject
Physical and Theoretical Chemistry
Cited by
6 articles.
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