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Chromophore Effect of Non-ionic Photoacid Generators on Resist Performances

  • Published:2008 Issue:3 Volume:21 Page:377-381
  • ISSN:0914-9244
  • Container-title:Journal of Photopolymer Science and Technology
  • language:en
  • Short-container-title:J. Photopol. Sci. Technol.

Author:

Nishimae Yuichi,Yamato Hitoshi,Asakura Toshikage,Ohwa Masaki

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Reference14 articles.

1. 1. M. Dusa, et. al., "Pitch Doubling Through Dual-Patterning Lithography Challenges in Integration and Litho Budgets", Proc. SPIE 6520, 65200G/1-65200G/10, 2007.

2. 2. Y. Ohmura, Presentation at SEMI Technology Symposium, held in Chiba (SEMI), December 2007.

3. 3. H. Nagasaka, Presentation at SEMI Technology Symposium, held in Chiba (SEMI), December 2005.

4. 4. R. R. Dammel, G. Pawlowski, A. Romano, F. M. Houlihan, W.-K. Kim, R. Sakamuri and D. Abdallah, Proc. SPIE. 5753, pp. 95-101, 2005.

5. 5. H. Tsuji, M. Yoshida, K. Ishizuka, T. Hirano, K. Endo and M. Sato, Proc. SPIE 5753, pp. 102-108, 2005.

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1. Anionic, Photoacid, and Photobase Initiating Systems;Photoinitiators;2021-04-05

2. Double-deprotected chemically amplified photoresists (DD-CAMP): higher-order lithography;SPIE Proceedings;2017-04-18

3. Higher-Order Lithography: Double-Deprotected Chemically Amplified Photoresists (DD-CAMP);Journal of Photopolymer Science and Technology;2017

4. Photoacid Generators (PAG) Systems;Photoinitiators for Polymer Synthesis;2012-12-21

5. Aryl sulfonates as neutral photoacid generators (PAGs) for EUV lithography;Advances in Resist Materials and Processing Technology XXVI;2009-03-13
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