Higher-Order Lithography: Double-Deprotected Chemically Amplified Photoresists (DD-CAMP)-Reference-Cited by-同舟云学术

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Higher-Order Lithography: Double-Deprotected Chemically Amplified Photoresists (DD-CAMP)

Published:2017 Issue:3 Volume:30 Page:351-359
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Soucie Deanna¹,Earley William¹,Hosoi Kenji²,Takahashi Arata²,Aoki Takashi²,Cardineau Brian¹,Miyauchi Koichi²,Brainard Robert¹

Affiliation:

1. SUNY Polytechnic Institute, Colleges of Nanoscale Science and Engineering

2. Central Glass

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/30/3/30_351/_pdf

Reference18 articles.

1. 1. H. Ito, Adv. Polym. Sci., 172 (2005) 37.

2. 2. H. Ito, IBM J. Res. Dev., 44 (2000) 119.

3. 3. R. Bristol, D. Shykind, S. Kim, Y. Borodovsky, E. Schwartz, C. Turner, G. Masson, K. Min, K. Esswein, and J. M. Blackwell, Proc. SPIE, 7273 (2009) 727307.

4. 4. J. Byers, S. Lee, K. Jen, P. Zimmerman, N. Turro, and C. G. Willson, J. Photopolym. Sci. Technol., 20 (2007) 707.

5. 5. J. S. Petersen, R. T. Greenway, T. Fuhner, P. Evanschitzky, F. Shao, and A. Erdmann, Proc. SPIE, 7274 (2009) 72421V.

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