Aryl sulfonates as neutral photoacid generators (PAGs) for EUV lithography-Reference-Cited by-同舟云学术

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Aryl sulfonates as neutral photoacid generators (PAGs) for EUV lithography

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXVI
language:
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Author:

Sulc Robert,Blackwell James M.,Younkin Todd R.,Putna E. Steve,Esswein Katherine,DiPasquale Antonio G.,Callahan Ryan,Tsubaki Hideaki,Tsuchihashi Tooru

Publisher

SPIE

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dissociative photoionization of phenyl triflate, a photoacid generator for photolithography, at 92 eV;The Journal of Chemical Physics;2024-04-01

2. Recent Progress in Photo-Acid Generators for Advanced Photopolymer Materials;Journal of Photopolymer Science and Technology;2020-07-01

3. Aryl Sulfonates as Initiators for Extreme Ultraviolet Lithography: Applications in Epoxy-Based Hybrid Materials;ChemPhotoChem;2018-03-06

4. Recent EUV Resists toward High Volume Manufacturing;Journal of Photopolymer Science and Technology;2014

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