Aryl Sulfonates as Initiators for Extreme Ultraviolet Lithography: Applications in Epoxy-Based Hybrid Materials-Reference-Cited by-同舟云学术

Aryl Sulfonates as Initiators for Extreme Ultraviolet Lithography: Applications in Epoxy-Based Hybrid Materials

Published:2018-03-06 Issue:5 Volume:2 Page:425-432
ISSN:2367-0932
Container-title:ChemPhotoChem
language:en
Short-container-title:ChemPhotoChem

Author:

Torti Edoardo¹,Protti Stefano¹,Bollanti Sarah²,Flora Francesco²,Torre Amalia²,Brusatin Giovanna³,Gerardino Annamaria⁴,Businaro Luca⁴,Fagnoni Maurizio¹^ORCID,Della Giustina Gioia³^ORCID,Mezi Luca²

Affiliation:

1. PhotoGreen Lab, Department of Chemistry; University of Pavia; V.Le Taramelli 12 27100 Pavia Italy

2. Fusion and Technology for Nuclear Safety and Security Department; ENEA; Via Enrico Fermi 45 00044 Frascati Rome) Italy

3. Department of Industrial Engineering; University of Padova; Via Marzolo 9 35131 Padova Italy

4. Photonics and Nanotechnologies Institute, CNR; Via Cineto Romano 42 00156 Rome Italy

Funder

Fondazione Cariplo

Publisher

Wiley

Subject

Organic Chemistry,Physical and Theoretical Chemistry,Analytical Chemistry

Reference78 articles.

1. Polymers in conventional and alternative lithography for the fabrication of nanostructures

2. Photoimaging and Lithographic Processes in Polymers

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