Pitch doubling through dual-patterning lithography challenges in integration and litho budgets-Reference-Cited by-同舟云学术

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Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Published:2007-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Dusa Mircea,Quaedackers John,Larsen Olaf F. A.,Meessen Jeroen,van der Heijden Eddy,Dicker Gerald,Wismans Onno,de Haas Paul,van Ingen Schenau Koen,Finders Jo,Vleeming Bert,Storms Geert,Jaenen Patrick,Cheng Shaunee,Maenhoudt Mireille

Publisher

SPIE

Cited by 45 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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