Analytical prediction of out-of-plane deflection of photomask protective membrane

Author:

Lee Yu Ching,Chang Po-Yi,Lee Yu-Jung,Wang Hau-Wei

Funder

Ministry of Science and Technology of Taiwan

Publisher

Elsevier BV

Subject

Applied Mathematics,Electrical and Electronic Engineering,Condensed Matter Physics,Instrumentation

Reference26 articles.

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4. D.C. Edelstein, Advanced Cu/Low-k BEOL integration, reliability, and extendibility, in: 2007 IEEE International Interconnect Technology Conference (IEEE IITC), 2007, pp. 57.

5. Novel approach of semiconductor BEOL processes integration;Weng,2008

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