Author:
Kasai Tatsuaki,Higashihara Tatsuya,Ueda Mitsuru
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference10 articles.
1. 1. R. Lawson, C. -T. Lee, , W. Yueh, , L. Tolbert, and C. L. Henderson, Proceedings of SPIE 6923, 69230Q (2008).
2. 2. International Technology Roadmap for Semiconductors (2010).
3. 3. A. D. Silva, N. M. Felix, and C. K. Ober, Adv. Mater. 20, 3355 (2008).
4. Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography
5. Molecular Glass Resists for High-Resolution Patterning
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