Molecular glass resists for scanning probe lithography-Reference-Cited by-同舟云学术

Molecular glass resists for scanning probe lithography

Published:2014-03-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Neuber Christian,Ringk Andreas,Kolb Tristan,Wieberger Florian,Strohriegl Peter,Schmidt Hans-Werner,Fokkema Vincent,Cooke Mike,Rawlings Colin,Dürig Urs,Knoll Armin W.,de Marneffe Jean-Francois,De Schepper Peter,Kaestner Marcus,Krivoshapkina Yana,Budden Matthias,Rangelow Ivo W.

Publisher

SPIE

Reference38 articles.

1. Organic materials for electronic and optoelectronic devices

2. Novel class of low molecular‐weight organic resists for nanometer lithography

3. Novel Electron-Beam Molecular Resists with High Resolution and High Sensitivity for Nanometer Lithography

4. Hydroxyphenylbenzene derivatives as glass forming molecules for high resolution photoresists

5. Fundamental Decomposition Analysis of Chemically Amplified Molecular Resist for below 22nm Resolution

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