Advanced Scanning Probe Nanolithography Using GaN Nanowires-Reference-Cited by-同舟云学术

Advanced Scanning Probe Nanolithography Using GaN Nanowires

Published:2021-06-30 Issue:13 Volume:21 Page:5493-5499
ISSN:1530-6984
Container-title:Nano Letters
language:en
Short-container-title:Nano Lett.

Author:

Behzadirad Mahmoud¹^ORCID,Mecholdt Stephan²³,Randall John N.⁴,Ballard Joshua B.⁴,Owen James⁴,Rishinaramangalam Ashwin K.¹,Reum Alexander³,Gotszalk Teodor⁵,Feezell Daniel F.¹,Rangelow Ivo W.²³,Busani Tito¹

Affiliation:

1. Center for High Technology Materials (CHTM), University of New Mexico (UNM), Albuquerque, New Mexico 87106, United States

2. Group of Nanoscale Systems, Technische Universität Ilmenau, Gustav-Kirchhoff-Straße1, 98693 Ilmenau, Germany

3. Nano Analytik GmbH, Ehrenbergstr. 1, 98693 Ilmenau, Germany

4. Zyvex Laboratories, 1301 North Plano Road, Richardson, Texas 75081, United States

5. Department of Nanometrology, Faculty of Microsystem Electronics and Photonics, Wroclaw University of Science and Technology, Janiszewskiego 11/17 Street, 50-372 Wroclaw, Poland

Funder

National Science Foundation

Publisher

American Chemical Society (ACS)

Subject

Mechanical Engineering,Condensed Matter Physics,General Materials Science,General Chemistry,Bioengineering

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.nanolett.1c00127

Reference48 articles.

1. Wells, O. C. Method and Apparatus for Low-Energy Scanning Electron Beam Lithography, U.S. Patent 4785189, 1988.

2. Advanced scanning probe lithography

3. High-resolution scanning probe lithography technology: a review

4. Sub-10 Nanometer Feature Size in Silicon Using Thermal Scanning Probe Lithography

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