Investigations on tip-based large area nanofabrication and nanometrology using a planar nanopositioning machine (NFM-100)

Abstract

Abstract This paper explores large area application of tip-based nanofabrication by field emission scanning probe lithography and showcases the simultaneous possibility of atomic force microscopy on macroscopic scales. This is made possible by the combination of tip-based technology and a planar nanopositioning and nanomeasuring machine. Using long range atomic force microscopy measurement of regular grating structures, the performance of the machine is thoroughly characterized over the full 100 mm range of motion of the positioning machine, which was confirmed by repeated measurements. After initially focussing on achieving the minimum line width of < 40 nm in microscopic areas, a grating with a pitch of 1 μm is additionally fabricated over a total length of 10 mm, whereby the dimensions and deviations are also considered.