Molecular Glass Resists for High-Resolution Patterning
Author:
Affiliation:
1. Department of Materials Science and Engineering, Cornell University, Bard Hall, Ithaca, New York 14853
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/cm052452m
Reference40 articles.
1. Chemical amplification mechanisms for microlithography
2. The Evolution of Materials for the Photolithographic Process
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5. Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography
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