Single-component chemically amplified i-line molecular glass photoresist based on calix[4]resorcinarenes
Author:
Publisher
Springer Science and Business Media LLC
Subject
Multidisciplinary
Link
http://link.springer.com/content/pdf/10.1007/s11434-014-0160-6.pdf
Reference36 articles.
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4. Anuja DS, Lee JK, Ober CK et al (2008) Study of the structure-properties relationship of phenolic molecular glass resists for next generation photolithography. Chem Mater 20:1606–1613
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