Optimization of e-beam Systems for Wafer Defect Inspection and for Die-to-Database Verification-Reference-Cited by-同舟云学术

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Optimization of e-beam Systems for Wafer Defect Inspection and for Die-to-Database Verification

Published:2009-09-04 Issue:1 Volume:23 Page:43-52
ISSN:1938-5862
Container-title:ECS Transactions
language:
Short-container-title:ECS Trans.

Author:

Kazmiruk Viacheslav V.,Barabanenkov Mikhail Y.

Abstract

Are discussed the factors limiting the facilities of electron optical part of the systems for wafer defect inspection and for geometry verification. Is determined the influence of those factors on the system parameters: throughput, spatial resolution and information quality.

Publisher

The Electrochemical Society

Link

https://iopscience.iop.org/article/10.1149/1.3183700/pdf

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimization of the Electron Optical System of a Scanning Electron Microscope for Measuring the Size of Micro- and Nanoobjects;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2019-07

2. Fringe field effects on electrostatic deflection of electrons by a pair of charged plates;Journal of Electrostatics;2018-08

3. Optimization of the conditions for recording secondary-emission signals during the 2D metrology of nanostructures;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2013-01

4. Development of the method of electron-optical in situ monitoring for periodic structures;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2010-10

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