Investigations of the Pad Trajectory Effect on the Asymmetric Profile and Arc-Shaped Scratches in Chemical Mechanical Polishing
Author:
Funder
Ministry of Trade, Industry & Energy
National Research Foundation of Korea
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Link
https://iopscience.iop.org/article/10.1149/2162-8777/ac14db/pdf
Reference14 articles.
1. Chemical boundary lubrication in chemical–mechanical planarization
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