Characterization of Chemical Vapor Deposited Amorphous Fluorocarbons for Low Dielectric Constant Interlayer Dielectrics-Reference-Cited by-同舟云学术

Characterization of Chemical Vapor Deposited Amorphous Fluorocarbons for Low Dielectric Constant Interlayer Dielectrics

Published:1999-06-01 Issue:6 Volume:146 Page:2219-2224
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Banerjee Indrajit¹,Harker Marnie¹,Wong L.²,Coon P. A.¹,Gleason Karen K.³

Affiliation:

1. Intel Corporation, Santa Clara, California 95052, United States of America

2. Portland Technology Development, Hillsboro, Oregon 97124, United States of America

3. Department of Chemical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States of America

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1391917/pdf

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