Characterization of low pressure chemical vapor deposited polymeric fluorinated carbon m (C:FX)n thin films with low dielectric constant-Reference-Cited by-同舟云学术

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Characterization of low pressure chemical vapor deposited polymeric fluorinated carbon m (C:FX)n thin films with low dielectric constant

Published:2006-01-13 Issue:1 Volume:83 Page:57-66
ISSN:0947-8396
Container-title:Applied Physics A
language:en
Short-container-title:Appl. Phys. A

Author:

Rastogi A.C.,Desu S.B.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00339-005-3435-6.pdf

Reference48 articles.

1. Peters L (2000) Semicond. Int. 23:108

2. Lin XW, Pramanik D (1998) Solid State Technol. 41:63

3. The National technology Roadmap for Semiconductors (Semicon. Ind. Assoc., San Jose, CA 2003)

4. Usami T, Shimokawa K, Yoshiaru M (1994) Jpn. J. Appl. Phys. Part I 33:408

5. ACS Symposium Series 874;HC Silvis,2004

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1. Vapor Deposition of Fluoropolymer Surfaces;Handbook of Fluoropolymer Science and Technology;2014-05-02

2. Preparation of Al, Ti, Zr-perfluoroheptanoate compounds and their use in ring opening polymerization;Applied Catalysis A: General;2012-05

3. Fabrication of PECVD-grown fluorinated hydrocarbon nanoparticles and circular nanoring arrays using nanosphere lithography;Applied Surface Science;2008-04

4. Vibrational and Photoelectron Investigation of Amorphous Fluorinated Carbon Films;The Journal of Physical Chemistry C;2007-10-30

5. Structural development and electronic properties of hot filament low pressure chemical vapor deposited fluorocarbon polymer films;Journal of Materials Research;2006-01-01

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