Atomic Layer Deposition and Performance of ZrO2-Al2O3Thin Films-Reference-Cited by-同舟云学术

Atomic Layer Deposition and Performance of ZrO2-Al2O3Thin Films

Published:2018 Issue:5 Volume:7 Page:P287-P294
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Kukli Kaupo^ORCID,Kemell Marianna^ORCID,Castán Helena,Dueñas Salvador,Seemen Helina,Rähn Mihkel,Link Joosep,Stern Raivo^ORCID,Heikkilä Mikko J.^ORCID,Ritala Mikko^ORCID,Leskelä Markku

Funder

Suomalainen Tiedeakatemia (Finnish Academy of Science and Letters)

European Regional Development Fund

Ministry of Economy and Competitiveness | Consejo Superior de Investigaciones Científicas (Spanish National Research Council)

Eesti Teadusagentuur (Estonian Research Council)

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference31 articles.

1. Structural and electronic properties of zirconia phases: A FP-LAPW investigations

2. Atomic layer deposition of Y-stabilized ZrO2 for advanced DRAM capacitors

3. Ferroelectricity in Simple Binary ZrO2 and HfO2

4. Aluminum-Doped Zirconia Nanopowders: Chemical Vapor Synthesis and Structural Analysis by Rietveld Refinement of X-ray Diffraction Data

5. Characterisation of ALCVD Al2O3–ZrO2 nanolaminates, link between electrical and structural properties

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