Author:
Chiang K. C.,Huang C. C.,Pan H. C.,Hsiao C. N.,Lin J. W.,Hsieh I. J.,Cheng C. H.,Chou C. P.,Chin A.,Hwang H. L.,McAlister S. P.
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference24 articles.
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3. High-/spl kappa/ Ir/TiTaO/TaN capacitors suitable for analog IC applications
4. Very high-density (23 fF//spl mu/m/sup 2/) RF MIM capacitors using high-/spl kappa/ TaTiO as the dielectric
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