High-/spl kappa/ Ir/TiTaO/TaN capacitors suitable for analog IC applications-Reference-Cited by-同舟云学术

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High-/spl kappa/ Ir/TiTaO/TaN capacitors suitable for analog IC applications

Published:2005-07 Issue:7 Volume:26 Page:504-506
ISSN:0741-3106
Container-title:IEEE Electron Device Letters
language:
Short-container-title:IEEE Electron Device Lett.

Author:

Chiang K.C.,Huang C.C.,Chin A.,Chen W.J.,McAlister S.P.,Chiu H.F.,Jiann-Ruey Chen ,Chi C.C.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials

Link

http://xplorestaging.ieee.org/ielx5/55/31403/01458970.pdf?arnumber=1458970

Cited by 34 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering;ECS Solid State Letters;2013-01-05

2. Ultra wide band frequency characterization of integrated TiTaO-based metal–insulator–metal devices;Journal of Applied Physics;2011-08-15

3. High-Performance Metal–Insulator-Metal Capacitor Using Stacked $\hbox{TiO}_{2}/\hbox{Y}_{2}\hbox{O}_{3}$ as Insulator;IEEE Electron Device Letters;2011-08

4. Electrical Properties of Bi2Ti2O7 Thin Films Grown at Low Temperature by the Pulsed Laser Deposition;Electrochemical and Solid-State Letters;2011

5. Optical properties of bismuth niobate thin films studied by spectroscopic ellipsometry;Thin Solid Films;2010-09

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