Ultra wide band frequency characterization of integrated TiTaO-based metal–insulator–metal devices
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3626067
Reference50 articles.
1. Compositional effect on the dielectric properties of high-k titanium silicate thin films deposited by means of a cosputtering process
2. Room-Temperature Deposited Titanium Silicate Thin Films for MIM Capacitor Applications
3. High performance metal-insulator-metal capacitor using a SrTiO3/ZrO2 bilayer
4. Wideband frequency and in situ characterization of ultra thin ZrO2 and HfO2 films for integrated MIM capacitors
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