Compositional effect on the dielectric properties of high-k titanium silicate thin films deposited by means of a cosputtering process-Reference-Cited by-同舟云学术

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Compositional effect on the dielectric properties of high-k titanium silicate thin films deposited by means of a cosputtering process

Published:2006-05 Issue:3 Volume:24 Page:600-605
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Brassard D.,Sarkar D. K.,El Khakani M. A.,Ouellet L.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.2180267

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