Author:
Ciofi Ivan,Mannarino Manuel,Li Yunlong,Croes Kristof,Beyer Gerald P.
Abstract
We present a new methodology for the characterization of Cu diffusion barriers, which is based on Triangular Voltage Sweep (TVS) measurements of Cu+ after Constant-Current Temperature Stress (CCTS). We show that CCTS-TVS measurements are effective for identifying defective Cu diffusion barriers. Finally, we discuss about mechanisms of Cu+ drift into dielectrics.
Publisher
The Electrochemical Society
Cited by
4 articles.
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