Author:
Kang Y. S.,Kim C. Y.,Cho M.-H.,An C.-H.,Kim H.,Seo J. H.,Kim C. S.,Lee T. G.,Ko D.-H.
Publisher
The Electrochemical Society
Subject
Electrical and Electronic Engineering,Electrochemistry,Physical and Theoretical Chemistry,General Materials Science,General Chemical Engineering
Reference12 articles.
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5. Synchrotron radiation photoemission spectroscopic study of band offsets and interface self-cleaning by atomic layer deposited HfO2 on In0.53Ga0.47As and In0.52Al0.48As
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