Effects of Mechanical Stress on the Growth Behaviors of Metal-Induced Lateral Crystallization-Reference-Cited by-同舟云学术

Effects of Mechanical Stress on the Growth Behaviors of Metal-Induced Lateral Crystallization

Published:2007 Issue:5 Volume:154 Page:H370
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:en
Short-container-title:J. Electrochem. Soc.

Author:

Song Nam-Kyu,Kim Min-Sun,Han Shin-Hee,Kim Young-Su,Joo Seung-Ki

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Recrystallization of amorphous silicon films deposited by low‐pressure chemical vapor deposition from Si2H6gas

2. Crystallization of LPCVD Silicon Films by Low Temperature Annealing

3. Crystallization of Ge and Si in metal films. I

4. Metal-contact-induced crystallization of semiconductors

5. Crystallization of amorphous silicon during thin‐film gold reaction

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