Author:
Kukli Kaupo,Aaltonen Titta,Aarik Jaan,Lu Jun,Ritala Mikko,Ferrari Sandro,Hårsta Anders,Leskelä Markku
Publisher
The Electrochemical Society
Subject
Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials
Reference60 articles.
1. Thin HfO2 films grown on Si(100) by atomic oxygen assisted molecular beam epitaxy
2. Growth mechanism difference of sputtered HfO2 on Ge and on Si
3. H. Hu, S.-J. Ding, C. Zhu, S.C. Rustagi, Y.F. Lu, M.F. Li, B.J. Cho, D.S. H. Chan, M.B. Yu, A. Chin, and D.-L. Kwong , inProceedings of the IEEE International Semiconductor Device Research Symposium, p. 328 (2003).
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