Author:
Kita Koji,Kyuno Kentaro,Toriumi Akira
Subject
Physics and Astronomy (miscellaneous)
Reference6 articles.
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2. Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing
3. H. Shimizu, M. Sasagawa, K. Kita, K. Kyuno, and A. Toriumi, Ext. Abst. Solid State Dev. Mat. (2003), pp. 486–487.
4. Characterization of ultrathin gate dielectrics by grazing X-ray reflectance and VUV spectroscopic ellipsometry on the same instrument
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