Role of a New Type Chelating Agent in Chemical Mechanical Polishing of R-Plane Sapphire Substrate-Reference-Cited by-同舟云学术

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Role of a New Type Chelating Agent in Chemical Mechanical Polishing of R-Plane Sapphire Substrate

Published:2017 Issue:9 Volume:6 Page:P618-P625
ISSN:2162-8769
Container-title:ECS Journal of Solid State Science and Technology
language:en
Short-container-title:ECS J. Solid State Sci. Technol.

Author:

Zhao Xin,Niu Xinhuan,Wang Jianchao,Yin Da,Yao Caihong

Funder

Major National Science and Technology Special Projects

Professional degree teaching case foundation of Hebei Province, China

Natural Science Foundation of Hebei Province, China

Natural Science Foundation of Tianjin, China

Publisher

The Electrochemical Society

Subject

Electronic, Optical and Magnetic Materials

Reference25 articles.

1. A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

2. Influence of Nano Abrasive on Chemical Mechanical Ultra-Precision Machining of Sapphire Substrate Surfaces

3. Highly efficient and reliable high power LEDs with patterned sapphire substrate and strip-shaped distributed current blocking layer

4. Ultraprecision CMP for sapphire, GaN, and SiC for advanced optoelectronics materials

5. Surface Planarization of GaN-on-Sapphire Template by Chemical Mechanical Polishing for Subsequent GaN Homoepitaxy

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Machining performance and material removal mechanism of sapphire with novel polishing slurry;Applied Surface Science;2024-10

2. Aluminum–air batteries: current advances and promises with future directions;RSC Advances;2024

3. Nanomaterials and Equipment for Chemical–Mechanical Polishing of Single-Crystal Sapphire Wafers;Coatings;2023-12-14

4. Effect of hydroxy carboxylates as complexing agent on improving chemical mechanical polishing performance of M-plane sapphire and action mechanism analysis;Ceramics International;2023-03

5. Effect of Chitosan Oligosaccharide as a Complexing Agent on Chemical Mechanical Polishing Performance of C-, A-, and R-Plane Sapphire Substrate;ECS Journal of Solid State Science and Technology;2022-10-01

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