Aging Effects of KOH+NH2OH Solution on the Etching Characteristics of Silicon
Author:
Publisher
The Electrochemical Society
Subject
Electronic, Optical and Magnetic Materials
Reference32 articles.
1. Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation Layers
2. Comparison of etch characteristics of KOH, TMAH and EDP for bulk micromachining of silicon (110)
3. Anisotropic etching in low‐concentration KOH: effects of surfactant concentration
4. Characterization of orientation-dependent etching properties of single-crystal silicon: effects of KOH concentration
5. Impact of alcohol additives concentration on etch rate and surface morphology of (100) and (110) Si substrates etched in KOH solutions
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1. High Speed Etching of Silicon in NaOH-Based Solution;Springer Proceedings in Physics;2024
2. Wet anisotropic etching characteristics of Si{111} in NaOH-based solution for silicon bulk micromachining;Micro and Nano Systems Letters;2022-12-01
3. Effect of IPA on Micromachining Characteristics of Silicon in KOH-Based Solution;Microactuators, Microsensors and Micromechanisms;2022-11-21
4. Etching Characteristics of Si{110} in NaOH Based Solution;Microactuators, Microsensors and Micromechanisms;2022-11-21
5. Enhanced etching characteristics of Si{100} in NaOH-based two-component solution;Micro and Nano Systems Letters;2022-08-01
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